PLASMA DIAGNOSTICS DISCHARGE PARAMETERS AND CHEMISTRY 1 PLASMA MATERAILS INTERACTIONS
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Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.
Author : Pio Capezzuto
ISBN : 9780080539102
Genre : Science
File Size : 55.41 MB
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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author : O. P. Solonenko
ISBN : 9067641316
Genre : Science
File Size : 65.49 MB
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The demands of industry for creating new functional materials with predetermined properties have stimulated an increasing interest in the investigation of processes occurring in plasma jets of complex chemical composition (homogeneous and heterogeneous) as well as their interaction with hard surfaces. This Proceedings volume contains contributions from leading international specialists on plasma science and technology which were presented at the 2nd International Workshop ''Plasma Jets in the Development in of New Materials Technology'', 3--9 September 1990, Frunze (USSR). The scope of the workshop incorporated the following aspects: -- modelling of the processes of momentum heat and mass transfer in homogeneous and heterogeneous plasma jets as well as interaction between the particles and the base; -- diagnostics of the parameters of gas and disperse phases in plasma flows; -- plasma-spraying processes investigations; -- processes of treatment and production of materials, including powder materials.
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. Key Features * Appeals to a broad range of industries from microelectronics to space technology * Discusses a wide array of new uses for plasma polymers * Provides a tutorial introduction to the field * Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization * Interests scientists, engineers, and students alike
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.