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Plasma Diagnostics

Author : Orlando Auciello
ISBN : 9781483216249
Genre : Science
File Size : 41.90 MB
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Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.
Category: Science

Plasma Deposition Of Amorphous Silicon Based Materials

Author : Pio Capezzuto
ISBN : 9780080539102
Genre : Science
File Size : 87.77 MB
Format : PDF
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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Category: Science

Laser Induced Breakdown Spectroscopy

Author : Sergio Musazzi
ISBN : 9783642450853
Genre : Technology & Engineering
File Size : 41.64 MB
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This book deals with the Laser-Induced Breakdown Spectroscopy (LIBS) a widely used atomic emission spectroscopy technique for elemental analysis of materials. It is based on the use of a high-power, short pulse laser excitation. The book is divided into two main sections: the first one concerning theoretical aspects of the technique, the second one describing the state of the art in applications of the technique in different scientific/technological areas. Numerous examples of state of the art applications provide the readers an almost complete scenario of the LIBS technique. The LIBS theoretical aspects are reviewed. The book helps the readers who are less familiar with the technique to understand the basic principles. Numerous examples of state of the art applications give an almost complete scenario of the LIBS technique potentiality. These examples of applications may have a strong impact on future industrial utilization. The authors made important contributions to the development of this field.
Category: Technology & Engineering

Plasma Deposition Treatment And Etching Of Polymers

Author : Riccardo d'Agostino
ISBN : 9780323139083
Genre : Technology & Engineering
File Size : 62.17 MB
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Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. Appeals to a broad range of industries from microelectronics to space technology Discusses a wide array of new uses for plasma polymers Provides a tutorial introduction to the field Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization Interests scientists, engineers, and students alike
Category: Technology & Engineering

Physical Processes Of The Interaction Of Fusion Plasmas With Solids

Author : Wolfgang O. Hofer
ISBN : UOM:39015046498625
Genre : Science
File Size : 32.23 MB
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The recent development of large fusion devices achieving near energy break-even scientifically proves the viability of fusion as an energy source. The challenge now facing fusion researchers is surmounting engineering obstacles to make fusion energy practical. Physical Processes of the Interaction of Fusion Plasmas with Solids discusses problems associated with plasma-surface interactions which represent a key issue in achieving engineering as opposed to scientific success. Unlike previous books on the subject, this text is directly related to the broad range of plasma-surface interactions problems encountered in fusion devices. Physical Processes of the Interaction of Fusion Plasmas with Solids provides the specialized international fusion community with a resource that covers the interesting new developments that have occurred with the advent of the larger fusion plasmadevices that have demonstrated near break-even energy. This book addresses problems that are useful for design and fabrication of such devices. The edge plasma Physical sputtering and radiation-enhanced sublimation Chemical erosion Electron emission from solids Control of plasma-surface interactions by thin films Thermal stability Radiation damage in metallic structural materials Radiation damage in carbon materials
Category: Science

New Technical Books

Author :
ISBN : UOM:39015063566544
Genre : Engineering
File Size : 83.14 MB
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Category: Engineering

Plasma Surface Interactions And Processing Of Materials

Author : O. Auciello
ISBN : 9789400919464
Genre : Science
File Size : 81.46 MB
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An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Category: Science